Titanium Target
THT is a factory with experience in producing high purity titanium targets and various titanium alloy sputtering targets. Our custom-made titanium targets have the following core advantages:
- High sputtering rate, uniform thickness of deposited film, and good adhesion to the substrate
- Pure Titanium Targets can achieve purities ranging from 99.5% to 99.995%. titanium targets of varying purities can be customized according to specific needs
- High density, low impurity content, capable of withstanding high-temperature thermal stress impact during sputtering, high utilization efficiency, and long lifespan of titanium target
- Specification
- Normal Target
| Material | Titanium (High Purity Titanium 99.5%~99.995% , Gr1, Gr2, Gr5, Gr7,GR12) |
| Titanium Aluminum Tungsten Niobium Silicon Target TiAlWNbSi Titanium Aluminum Chromium Target TiAlCr Titanium Aluminum Tungsten Target TiAlW Titanium Aluminum Tantalum Target TiAlTa Titanium Aluminum Vanadium Target TiAlV Titanium Aluminum Silicon Target TiAlSi |
|
| Dimension | 1. Round target: Ø30–2000mm, thickness 3.0mm–300mm; |
| 2. Plate Target: Length: 200-500mm Width:100-230mm Thickness:3–40mm | |
| 3. Tube target: Dia:30-200mm Thickness:5-20mm Length:500-2000mm | |
| 4. Customized is available | |
| Production Process | Titanium sponge — Smelted to titanium ingot —Test—Cutting the ingot — Forging —Rolling —Peeling —Straightening—Ultrasonic flaw detection — Packing |
| Application | Semiconductor separation, Film coating materials, Storage Electrode coating, Sputtering coating, Surface coating, Glass coating industry. |
| Technique | Forging ,Machining |
|
Quality Control |
①Technicians self-check in production； |
| ②Engineer spot check in production； | |
|
③QC inspect after products finished； |
|
|
④International sales who were trained the technical know-how spot check before shipping to ensure the quality. |
| Dimension /mm | Ti
TA1 |
TiAl 30/70 | TiAl 33/67 | TiAl 50/50 | Cr 99.8% | CrAl 30/70 | TiSi 80/20 | WC 99.9% |
| Φ63*32 | ● | ● | ● | ● | ● | ● | ● | |
| Φ100*32 | ● | ● | ● | ● | ● | ● | ● | |
| Φ105*16 | ● | ● | ● | ● | ● | ● | ● | |
| Φ160*12 | ● | ● | ● | ● | ● | ● | ● | |
| 170*75*12 | ● | ● | ● | ● | ||||
| 331*174*24 | ● | ● | ● | ● | ● | ● | ||
| 400*88*10 | ● | ● | ● | ● | ● | ● | ||
| 574*174*20 | ● | ● | ● | ● | ● | ● | ||
| 741*191*18 | ● | ● | ● | ● | ● | ● | ||
| 754*154*18 | ● | ● | ● | ● | ● | ● | ||
| 1701*132*12 | ● | ● | ● | ● | ● | |||
| Process | Melting | HIP | HIP | Melting | HIP | HIP | HIP | HIP |
Why THT Titanium Target 1?
- Raw Materials: Starting from the titanium powder stage, precise screening is conducted strictly in accordance with purity and composition standards
- Titanium Ingot Preparation Process: Complete pre-gas treatment in an ultra-high vacuum environment, precisely controlling the amount of hydrogen doping; then carry out vacuum sintering of titanium powder for primary forming, followed by secondary sintering using a hot isostatic press to ensure the density and structural stability of the titanium ingot.
- Accurate Component Detection: Comprehensive detection of titanium target components is conducted using a carbon sulfur analyzer and an oxygen nitrogen analyzer
Why THT Titanium Target 2?
- Heat Treatment: Through professional heat treatment processes, internal stress in the material is effectively eliminated, grain refinement and rearrangement are achieved, and the texture of the billet is made uniform and consistent.
- Comprehensive Flaw Detection: Utilizing multiple inspection methods such as ultrasonic flaw detection, X-ray flaw detection, magnetic particle flaw detection, and penetrant flaw detection, to thoroughly inspect internal and surface defects of materials.
- Precision Machining: Equipped with a complete CNC machining production line including turning, milling, planing, and grinding, it achieves high-precision forming processing, ensuring that product dimensional tolerances and surface accuracy meet standards
Application
1. Industrial Thin-Film Coating Applications: Such as consumer electronics, daily necessities, automotive components, etc.
2. Barrier film materials for integrated circuit chips or semiconductor wafers
3. Thin-Film Deposition for Flat-panel Displays: Such as liquid crystal displays, organic light-emitting diodes, etc.
4. High-End Coating Equipment: Such as magnetron sputtering systems, ion plating machines, etc.
5. CD, DVD, disk coatings, decorative coatings, wear-resistant coatings, etc.
Related Products
What is PVD Coating?
PVD full name is Physical Vapor Deposition, is a physical thin-film deposition technique. In a high-vacuum environment, solid materials are vaporized, and these particles are then deposited onto the substrate surface. This process ultimately forms functional coatings of pure metals, alloys, or compounds with thicknesses ranging from several nanometers to several micrometers.
Currently PVD coating processes are primarily categorized into two types: Sputtering and Thermal Evaporation. The differences between them are as follows:
Sputtering: Utilizes high-energy particles to bombard the target material surface, imparting sufficient energy to atoms or molecules to detach from the surface. These particles then deposit onto the substrate in a stream, forming a uniform and dense coating.
Thermal Evaporation: In a high-vacuum environment, the coating material is heated to temperatures reaching or exceeding its boiling point, causing it to rapidly vaporize into a vapor stream. Vapor particles move within the vacuum chamber and adhere to the cooler substrate surface, ultimately condensing to form a film.
Our titanium target is vacuum-sealed and placed in precision slots made of foam or bubble wrap. The outer packaging consists of export-grade wooden crates.
Yes, we could.
It depends on dimension , purity and quantity you need.
Yes, we could.
Yes, we could make bonding for titanium target.
Titanium target is mainly for thin-film coating production.
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